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Fluoride-free UV-assisted etching of multilayer Mo2C

Fluoride-free UV-assisted etching of multilayer Mo2C

【Numbering】BK2020070902 【CAS】CAS
【Item No.】BK2020070902-03 【specification】
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product information:
Name: UV-assisted etching of multilayer Mo2CTx
Size: 1-5um
Number of layers: 10-20 layers
Product performance: high purity and excellent electrochemical performance
Functional group: -OH-F-O-Cl (customizable)
Purity: 99%
Storage conditions: room temperature and dry
Process: freeze drying
Specific details: The new UV-assisted selective etching method can etch Ga atoms in the Mo2Ga2C precursor to obtain fluorine-free Mo2C MXene, and avoid the use of toxic and highly corrosive acids. The obtained MXene exhibits a unique 2D graphene-like structure and high purity. When used as a negative electrode material for rechargeable batteries, it exhibits outstanding rate performance and cycle stability. The lithium storage capacity can be stabilized at about 150 mAh g-1, while the sodium storage can be stabilized at about 50 mAh g-1 . In addition, the flexible Mo2CMXene-based battery has outstanding capacity retention rates (89% and 74%). Therefore, this kind of MXene shows great potential in ion storage applications, and this green synthesis method can expand other MXene synthesis ideas, which is of great reference significance.
Application areas: energy storage, catalysis, analytical chemistry, mechanics, adsorption, biology, microelectronics, sensors, etc.
Size craft can be customized


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Warm tips: Suzhou Beike nano products are only used for scientific research, not for human body,different batches of products have different specifications and performance.The website pictures are from the Internet. The pictures are for reference only. Please take the real object as the standard. In case of infringement, please contact us to delete them immediately.
    多層MXene粉末

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